首页> 外文期刊>Applied Surface Science >The effect of electric current and surface oxidization on the growth of Sn whiskers
【24h】

The effect of electric current and surface oxidization on the growth of Sn whiskers

机译:电流和表面氧化对锡晶须生长的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Electric current was applied on pure Sn-plated leadframes to evaluate the effects of current-induced stress on the growth of Sn whiskers. The samples were stored at room temperate and 55 ℃/85% relative humidity (RH) conditions with an induced current range of 0.1 A to 0.5 A. The samples stored at the room temperature did not grow the whiskers at any of the current conditions until 3000 hrs. As the current flow increased, irregular intermetallic compounds (IMCs) grew at the interface between the Sn finish and Cu substrate. However, various lengths of columnar and bent whiskers were observed under all current conditions, after exposure to 55 ℃/85% RH conditions for 1000 hours. At the same temperature, the higher current levels showed longer whiskers than lower current levels. The Sn oxide had the α-SnO_2 structure of the rutile phase which was non-uniformly formed on the surface of the Sn finish. The grain size of the SnO_2 was estimated to be several nanometers. The SnO_2 film was up to a thickness of ~23 nm on the Sn whisker surface stored at 55 ℃/85% RH conditions for 3000 hours.
机译:将电流施加到纯锡镀的引线框架上,以评估电流感应应力对锡晶须生长的影响。样品在室温和55℃/ 85%相对湿度(RH)的条件下存储,感应电流范围为0.1 A至0.5A。在室温下存储的样品在任何电流条件下均不生长晶须,直到3000小时随着电流的增加,不规则金属间化合物(IMC)在Sn涂层和Cu衬底之间的界面处生长。然而,暴露于55℃/ 85%RH条件下1000小时后,在所有当前条件下均观察到各种长度的柱状和弯曲晶须。在相同温度下,较高的电流水平比较低的电流水平显示更长的晶须。锡氧化物具有金红石相的α-SnO_2结构,该结构在锡表面上不均匀地形成。 SnO_2的晶粒尺寸估计为几纳米。在55℃/ 85%RH条件下保存3000小时的锡晶须表面上,SnO_2膜的厚度达到〜23 nm。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号