首页> 外文期刊>Applied Surface Science >Microstructure and electrical properties of Mn-doped barium strontium titanate thin films prepared on copper foils
【24h】

Microstructure and electrical properties of Mn-doped barium strontium titanate thin films prepared on copper foils

机译:铜箔上制备的锰掺杂钛酸锶锶钡薄膜的微观结构和电性能

获取原文
获取原文并翻译 | 示例
       

摘要

Ba_(0.7-x)Sr_(0.3)Mn_xTiO_3(x = 0,0.025,0.05) thin films have been prepared on copper foils using sol-gel method. The films were processed in an atmosphere with low oxygen pressure so that the substrate oxidation is avoided and the formation of the perovskite phase is allowed. XRD and SEM results showed that Mn doping enhanced the crystallization of the perovskite phase in the films. The Mn substitution prevents the reduction of Ti~(4+) to Ti~(3+), which is supported by XPS analysis. The Ba_(0.7-x)Sr_(0.3)Mn_xTiO_3 film with x= 0.025 (BSMT25) exhibits preferred dielectric behavior and a lower leakage current density among the three thin films. The dielectric constant and loss of the BSMT25 film are 1213.5 and 0.065 at 1 MHz and around zero field, which are mostly desired for embedded capacitor applications. The mechanism of Mn doping on improving the electrical properties of barium strontium titanate (BST) thin films was investigated.
机译:使用溶胶-凝胶法在铜箔上制备了Ba_(0.7-x)Sr_(0.3)Mn_xTiO_3(x = 0,0.025,0.05)薄膜。在低氧气压力的气氛中对膜进行处理,从而避免了基底氧化并且允许钙钛矿相的形成。 XRD和SEM结果表明,Mn掺杂增强了膜中钙钛矿相的结晶。 Mn取代可防止Ti〜(4+)还原为Ti〜(3 +),XPS分析证明了这一点。 x = 0.025(BSMT25)的Ba_(0.7-x)Sr_(0.3)Mn_xTiO_3膜在三个薄膜中表现出较好的介电性能和较低的漏电流密度。 BSMT25薄膜的介电常数和损耗在1 MHz和零场附近为1213.5和0.065,这是嵌入式电容器应用中最需要的。研究了锰掺杂改善钛酸钡锶钡(BST)薄膜电性能的机理。

著录项

  • 来源
    《Applied Surface Science》 |2010年第22期|p.6531-6535|共5页
  • 作者单位

    Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518067, China,Institute of Marine Materials Science and Engineering, Shanghai Maritime University, Shanghai 200135, China;

    Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518067, China;

    Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518067, China;

    Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518067, China;

    Institute of Marine Materials Science and Engineering, Shanghai Maritime University, Shanghai 200135, China;

    Department of Physics, The Chinese University of Hong Kong, Hong Kong, China;

    Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518067, China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin films; sol-gel growth; microstructure; electrical properties;

    机译:薄膜;溶胶-凝胶生长;微观结构电性能;
  • 入库时间 2022-08-18 03:07:34

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号