首页> 外文期刊>Applied Surface Science >Investigation of magnetic properties for oblique deposited granular films by magnetic field annealing
【24h】

Investigation of magnetic properties for oblique deposited granular films by magnetic field annealing

机译:磁场退火法研究倾斜沉积颗粒膜的磁性能

获取原文
获取原文并翻译 | 示例
       

摘要

A series of (Fe_(57)Co_(24)Ni_4Nb_2B_(13)_)_x-(SiO_2)_(1-x) nano-granular thin films were fabricated by magnetron sputtering with different oblique incidence angle θ and excellent soft magnetic properties are achieved. Based on the results of magnetic field anneal at different temperature T_a. it is evidenced that orientation of atomic pairs contributes to the annealing treatment, and could manipulate magnetic anisotropy. The damping coefficient α decreases with increasing angle θ and this is ascribed to the anisotropy dissipation.
机译:通过磁控溅射法制备了具有不同斜入射角θ和优异的软磁性能的一系列(Fe_(57)Co_(24)Ni_4Nb_2B_(13)_)_ x-(SiO_2)_(1-x)纳米颗粒薄膜。实现。基于不同温度T_a下的磁场退火结果。有证据表明,原子对的取向有助于退火处理,并且可以操纵磁各向异性。阻尼系数α随着角度θ的增加而减小,这归因于各向异性耗散。

著录项

  • 来源
    《Applied Surface Science》 |2010年第21期|P.6168-6171|共4页
  • 作者单位

    Key Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

    rnKey Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

    rnKey Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

    rnKey Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

    rnKey Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

    rnKey Laboratory for Magnetism and Magnetic Materials of Ministry of Education, Lanzhou University, Lanzhou 730000, PR China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    annealing; magnetic thin films; magnetic anisotropy; damping coefficient; magnetic sputtering;

    机译:退火;磁性薄膜磁各向异性阻尼系数磁溅射;
  • 入库时间 2022-08-18 03:07:33

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号