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Characterization and properties of ZnO_(1-x)S_x alloy films fabricated by radio-frequency magnetron sputtering

机译:射频磁控溅射制备ZnO_(1-x)S_x合金薄膜的表征与性能

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摘要

A series of ZnO_(1-x)S_x alloy films (0≤x≤1) were grown on quartz substrates by radio-frequency (rf) magnetron sputtering of ZnS ceramic target, using oxygen and argon as working gas. X-ray diffraction measurement shows that the ZnO_(1-x)S_x films have wurtzite structure with (002) preferential orientation in O-rich side (0≤x≤0.23) and zinc blende structure with (111) preferential orientation in S-rich side (0.77≤x ≤1). However, when the S content is in the range of 0.23
机译:使用氧气和氩气作为工作气体,通过射频(rf)磁控溅射ZnS陶瓷靶,在石英衬底上生长了一系列ZnO_(1-x)S_x合金膜(0≤x≤1)。 X射线衍射测量表明,ZnO_(1-x)S_x膜在富O侧(0≤x≤0.23)具有(002)优先取向的纤锌矿结构和在S-富边(0.77≤x≤1)。然而,当S含量在0.23 <x <0.77的范围内时,ZnO_(1-x)S_x膜由纤锌矿和锌共混物的两相或非晶ZnO_(1-x)S_x相组成。薄膜的带隙能量显示出对S含量的非线性依赖性,光学弯曲参数约为2.9 eV。光致发光(PL)测量表明,纤锌矿型ZnO_(1-x)S_x的PL光谱以可见带为主,与未掺杂的ZnO相比,其PL强度和紫外可见带的强度比大大降低。所有退火后的ZnO_(1-x)S_x薄膜均具有绝缘性,但退火后w-ZnO_(1-x)S_x呈现n型导电性,并保持3-ZnO_(1-x)S_x的绝缘性。本文探讨了S对ZnO_(1-x)S_x合金光学和电学性质的影响机理。

著录项

  • 来源
    《Applied Surface Science》 |2010年第14期|p.4621-4625|共5页
  • 作者单位

    Department of Physics, jilin University, Changchun 130023, PR China;

    rnDepartment of Physics, jilin University, Changchun 130023, PR China;

    rnDepartment of Physics, jilin University, Changchun 130023, PR China Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, PR China State Key Lab Superhard Material, Jilin University, Changchun, 130012, PR China;

    rnDepartment of Physics, jilin University, Changchun 130023, PR China;

    rnDepartment of Physics, jilin University, Changchun 130023, PR China;

    rnDepartment of Physics, jilin University, Changchun 130023, PR China;

    rnKey Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Rf-magnetron sputtering; ZnO_(1-x)S_x alloy films; crystal structure; optical and electrical properties;

    机译:射频磁控溅射;ZnO_(1-x)S_x合金膜;晶体结构光电性能;
  • 入库时间 2022-08-18 03:07:29

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