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Improving the visible transmittance of low-e titanium nitride based coatings for solar thermal applications

机译:改善用于太阳能热应用的低辐射氮化钛基涂料的可见光透射率

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摘要

Low-emissivity (low-e) coatings on glass are nowadays extensively used for energy saving applications in architectural windows and on solar thermal collectors. In this work the feasibility of TiN-based layers as low-e coatings has been studied. TiN samples were deposited by reactive magnetron sputtering and, in order to improve their optical properties (transmission in the visible range, T and emissiv-ity, e), we have investigated the changes in optical response following three different approaches: (i) post-deposition annealing treatments up to 500℃, (ii) doping the TiN layers with aluminium (target composition: Ti/Al = 90/10,75/25 and 50/50) and (iii) deposition of antireflective coatings of TiO_2 in multilayers structures. The crystalline structure and chemical composition of the multilayers were studied by X-Ray Diffraction and Rutherford Backscattering Spectroscopy, respectively. Spectroscopic Ellipsom-etry, Fourier Transform Infrared Spectroscopy and direct emissivity measurements were employed to determine the optical properties Tand e. We have concluded that the most noticeable improvement has been obtained by the deposition of multilayers structures increasing in a 30% the original transmittance of the single TiN coatings.
机译:如今,玻璃上的低发射率(low-e)涂层广泛用于建筑窗和太阳能集热器的节能应用。在这项工作中,已经研究了基于TiN的层作为低辐射涂层的可行性。 TiN样品通过反应磁控溅射沉积,为了改善其光学性能(可见光范围内的透射率,T和发射率e),我们研究了以下三种不同方法的光学响应变化:沉积退火处理,最高可达到500℃,(ii)用铝掺杂TiN层(目标成分:Ti / Al = 90 / 10,75 / 25和50/50),以及(iii)多层沉积TiO_2的抗反射涂层结构。分别通过X射线衍射和卢瑟福背散射光谱法研究了多层的晶体结构和化学组成。使用光谱椭圆光谱法,傅立叶变换红外光谱法和直接发射率测量来确定光学性质Tand e。我们得出的结论是,多层结构的沉积使单层TiN涂层的原始透射率提高了30%,从而获得了最明显的改善。

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  • 来源
    《Applied Surface Science》 |2011年第5期|p.1784-1788|共5页
  • 作者单位

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, E-28049 Madrid, Spain;

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, E-28049 Madrid, Spain;

    Universidade do Minho, Dept. Fisica, Campus de Azurem, 4800-058 Guimaraes, Portugal;

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, E-28049 Madrid, Spain;

    Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, E-28049 Madrid, Spain;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    low-emissivity; TiN; magnetron sputtering;

    机译:低发射率锡;磁控溅射;
  • 入库时间 2022-08-18 03:07:12

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