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Molecular dynamics study of void effect on nanoimprint of single crystal aluminum

机译:空隙效应对单晶铝纳米压印的分子动力学研究

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摘要

Pre-existing defects can alter mechanical behavior of materials significantly under applied load. In current study molecular dynamics (MD) simulations are performed to reveal pre-existing void effect on nanoimprint of single crystal Al thin films, such as deformation mechanism and spring back phenomenon. Current simulation results show void acts as strong barrier to dislocation motion, although plastic deformation is dominantly controlled by dislocation activities. It indicates the void volume fraction has strong influence on nanoimprint: the larger the void volume fraction, the smaller the maximum force required for initial dislocation nucleation, and the stronger the interaction between extended dislocation and void. It also demonstrates that there is a critical void volume fraction for minimum spring back, which is resulted from competition between two roles affecting dislocation annihilation.
机译:预先存在的缺陷会在施加负载的情况下极大地改变材料的机械性能。在当前的研究中,进行分子动力学(MD)模拟以揭示预先存在的对单晶Al薄膜纳米压印的空隙效应,例如变形机制和回弹现象。当前的模拟结果表明,空隙是位错运动的强大障碍,尽管塑性变形主要由位错活动控制。它表明空隙体积分数对纳米压印有很强的影响:空隙体积分数越大,初始位错成核所需的最大力越小,扩展位错与空隙之间的相互作用越强。它还表明,对于最小的回弹,存在一个关键的空隙体积分数,这是由影响位错ation灭的两个角色之间的竞争导致的。

著录项

  • 来源
    《Applied Surface Science》 |2011年第16期|p.7140-7144|共5页
  • 作者单位

    Center for Precision Engineering, Harbin Institute of Technology, Harbin, PR China;

    Center for Precision Engineering, Harbin Institute of Technology, Harbin, PR China;

    Center for Precision Engineering, Harbin Institute of Technology, Harbin, PR China;

    Center for Precision Engineering, Harbin Institute of Technology, Harbin, PR China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    nanoimprint; molecular dynamics; void volume fraction; spring back;

    机译:纳米压印;分子动力学;空体积分数;回弹;
  • 入库时间 2022-08-18 03:07:05

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