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The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition

机译:铱前驱物对原子层沉积制备的氧化物负载铱催化剂的影响

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摘要

Alumina, silica and beta zeolite supported iridium catalysts were prepared by atomic layer deposition (AID) from two different metal precursors, Ir(acac)3 and Iitthd)(COD). The use of Ir(thd)(COD) in ALD is reported for the first time. The aim was to investigate the effect of the precursor on catalyst surface species, chemical state and characteristics.Controllable ALD reaction was successful with both iridium precursors on alumina and with Ir(acac)3 on p zeolite. On these catalysts, iridium particle sizes were very small (1-3 nm). Instead, some thermal decomposition of both precursors was observed during deposition on silica. At conditions, where no or very little decomposition of the precursors took place, the differences in the chemical state and characteristics of the as-prepared Ir/support samples were negligible, In ALD, lr(acac)_3 is slightly more stable at high deposition temperatures (>200℃) while Ir(thd)(COD) enables the utilization of larger temperature range since it vaporizes at lower temperature compared to Ir(acac)_3. The results thus indicate that Ir(thd)(COD) is a suitable new precursor for ALD.
机译:通过原子层沉积(AID)从两种不同的金属前驱体Ir(acac)3和Iitthd)(COD)制备氧化铝,二氧化硅和β沸石负载的铱催化剂。首次报道了在ALD中使用Ir(thd)(COD)。目的是研究前体对催化剂表面种类,化学状态和特性的影响。氧化铝上的铱前体和对沸石上的Ir(acac)3均可成功地控制ALD反应。在这些催化剂上,铱的粒径非常小(1-3纳米)。相反,在二氧化硅上沉积的过程中观察到了两种前体的热分解。在没有前驱物分解或分解很少的条件下,制备的Ir /载体样品的化学状态和特性差异可忽略不计。在ALD中,lr(acac)_3在高沉积下稍微更稳定温度(> 200℃)时,由于Ir(thd)(COD)与Ir(acac)_3相比在较低温度下蒸发,因此可以利用更大的温度范围。因此结果表明,Ir(thd)(COD)是ALD的合适新前体。

著录项

  • 来源
    《Applied Surface Science》 |2011年第9期|p.4204-4210|共7页
  • 作者单位

    Aalto University School of Science and Technology, Department of Biotechnology and Chemical Technology, Industrial Chemistry Research Croup, P.O. Box 16100, FI-00076Aalto, Finland;

    Tampere University of Technology, Surface Science Laboratory, P.O. Box 692, FI-33101 Tampere, Finland;

    Neste Oil Corporation, P.O. Box 310, FI-06101 Porvoo, Finland;

    Tampere University of Technology, Surface Science Laboratory, P.O. Box 692, FI-33101 Tampere, Finland;

    Aalto University School of Science and Technology, Department of Biotechnology and Chemical Technology, Industrial Chemistry Research Croup, P.O. Box 16100, FI-00076Aalto, Finland;

    Aalto University School of Science and Technology, Department of Biotechnology and Chemical Technology, Industrial Chemistry Research Croup, P.O. Box 16100, FI-00076Aalto, Finland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Iridium catalysts,ALD,Metal precursor,Catalyst characterization;

    机译:铱催化剂;ALD;金属前驱体;催化剂表征;
  • 入库时间 2022-08-18 03:07:02

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