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Preparation and electrochemical characterization of NiO nanostructure-carbon nanowall composites grown on carbon cloth

机译:碳布上生长的NiO纳米结构-碳纳米壁复合材料的制备和电化学表征

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摘要

This study provided a simple method to form NiO nanostructures onto the carbon nanowalls (CNWs) surface to enhance the performance of electric double layer capacitor (EDLC) characteristics. The CNWs were synthesized on carbon cloth by rf magnetron sputtering without any catalyst. Ni film was then deposited on the synthesized CNWs by e-beam evaporator. Subsequently, the vacuum annealing process and oxygen plasma treatment were used to form the NiO nanostructures. The crystallize structures of NiO nanostructures and CNWs were examined by Raman scattering spectroscopy. To realize the electrochemical properties of NiO/CNWs/carbon cloth composite, cyclic voltammetry (CV) and galvanostatic charge-discharge tests were investigated. Due to the relatively larger surface area of CNWs and the quickly reversible redox reaction and pseudo-capacitive properties of NiO nanostructures, the measured results demonstrated that the NiO/CNWs/carbon cloth is a suitable electrode material for EDLC applications.
机译:这项研究提供了一种在碳纳米壁(CNWs)表面上形成NiO纳米结构的简单方法,以增强双电层电容器(EDLC)特性的性能。不用任何催化剂,通过射频磁控溅射在碳布上合成CNW。然后通过电子束蒸发器将镍膜沉积在合成的CNW上。随后,使用真空退火工艺和氧等离子体处理来形成NiO纳米结构。通过拉曼散射光谱法检查了NiO纳米结构和CNW的结晶结构。为了实现NiO / CNWs /碳布复合材料的电化学性能,研究了循环伏安法和恒电流充放电试验。由于CNW的相对较大的表面积以及NiO纳米结构的快速可逆的氧化还原反应和拟电容特性,因此测量结果表明NiO / CNWs /碳布是适合EDLC应用的电极材料。

著录项

  • 来源
    《Applied Surface Science》 |2012年第22期|p.8599-8602|共4页
  • 作者单位

    Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 106, Taiwan;

    Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 106, Taiwan;

    Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 106, Taiwan;

    Department of Electronic Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 106, Taiwan,Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, No. 43, Sec. 4, Keelung Road, Taipei 106, Taiwan;

    Graduate Institute of Electro-Optical Engineering, Tatung University, No. 40, Sec. 3, Chungshan North Road, Taipei 104, Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    NiO; carbon nanowall; thermal chemical vapor deposition; plasma enhance chemical vapor deposition; electric double layer capacitor; scanning electron microscopy;

    机译:氧化镍碳纳米壁热化学气相沉积;等离子体增强化学气相沉积;双电层电容器扫描电子显微镜;
  • 入库时间 2022-08-18 03:06:46

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