机译:SF_6 / Ar气体混合比对BZN薄膜腐蚀行为和性能的影响
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China;
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, People's Republic of China;
BZN; reaction ion etching; XPS; plasma;
机译:CHF_3 / Ar气体混合比对BST薄膜刻蚀特性的影响
机译:射频功率对SF _6 / Ar中BZN薄膜蚀刻的影响
机译:在SF_6和SF_6 / AR等离子体中蚀刻无定形GE-SB-SE薄膜期间的表面组成和微掩除效果
机译:SF6 / Ar等离子体中BZN薄膜的电感耦合等离子体蚀刻
机译:探索薄膜纳米压痕过程中基底效应和弹性应变特性的起源。
机译:使用不同Ar / O2流量比制备的RF溅射RuO2薄膜的pH传感特性
机译:使用电感耦合等离子体蚀刻O2 / Bcl3 / Ar气体混合物中氧化铟锡氧化物薄膜的蚀刻性能
机译:溶液前驱体性质对溶胶 - 凝胶衍生pZT薄膜结晶行为和性能的影响