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In_6Se_7 thin films by heating thermally evaporated indium and chemical bath deposited selenium multilayers

机译:通过加热热蒸发的铟和化学浴沉积的硒多层膜形成In_6Se_7薄膜

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摘要

Indium selenide (In_6Se-7) thin films were prepared via selenization of thermally evaporated indium thin films by dipping in sodium selenosulphate solution followed by annealing in nitrogen atmosphere. First, indium was thermally evaporated on glass substrate. Then, the indium coated glass substrates were dipped in a solution containing 80 ml 0.125 M sodium selenosulphate and 1.5 ml dilute acetic acid (25%) for 5 min. Glass/In-Se layers were annealed at 200-400 ℃ in nitrogen atmosphere (0.1 Torr) for 30 min. X-ray diffraction studies showed the formation of monoclinic In_6Se_7. Morphology of the thin films formed at different conditions was analyzed using Scanning electron microscopy. The elemental analysis was done using Energy dispersive X-ray detection. Electrical conductivity under dark and illumination conditions was evaluated. Optical band gap was computed using transmittance and reflectance spectra. The band gap value was in the range 1.8-2.6 eV corresponding to a direct allowed transition. We studied the effect of indium layer thickness and selenium deposition time on the structure, electrical and optical properties of In_6Se_7 thin films.
机译:通过将热蒸发的铟薄膜硒化来制备硒化铟(In_6Se-7)薄膜,方法是将其浸入硒代硫酸钠溶液中,然后在氮气氛中退火。首先,将铟在玻璃基板上热蒸发。然后,将涂有铟的玻璃基板浸入含有80 ml 0.125 M硒代硫酸钠和1.5 ml稀乙酸(25%)的溶液中5分钟。将玻璃/ In-Se层在氮气气氛(0.1托)中于200-400℃退火30分钟。 X射线衍射研究表明单斜In_6Se_7的形成。使用扫描电子显微镜分析在不同条件下形成的薄膜的形态。使用能量色散X射线检测进行元素分析。评价了在黑暗和光照条件下的电导率。使用透射率和反射光谱计算光学带隙。带隙值在1.8-2.6 eV范围内,对应于直接允许的跃迁。我们研究了铟层厚度和硒沉积时间对In_6Se_7薄膜的结构,电学和光学性质的影响。

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  • 来源
    《Applied Surface Science》 |2012年第15期|p.5753-5758|共6页
  • 作者单位

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico;

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico;

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico Universidad Autonoma de Nuevo Leon-CIIDIT, Apodaca, N.L, Mexico;

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico;

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico;

    Universidad Autonoma de Nuevo Leon, Facultad de lngenieria Mecdnica y Electrica, San Nicolas de los Garza, Nuevo Leon-66450, Mexico Universidad Autonoma de Nuevo Leon-CIIDIT, Apodaca, N.L, Mexico;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    In_6Se_7 thin films; chemical bath deposition; XRD; photoconductivity;

    机译:In_6Se_7薄膜;化学浴沉积;XRD;光电导;

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