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High resolution photoemission study of interface formation between MgO and the selenium passivated InAs (100) surface

机译:MgO与硒钝化InAs(100)表面之间界面形成的高分辨率光发射研究

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Interface formation between an ultra thin MgO layer and the selenium passivated InAs surface has been investigated by soft X-ray photoemission spectroscopy. Atomic hydrogen cleaning of the native oxide covered InAs at 360 ℃ produced an oxide and carbon free InAs surface. The selenium passivation of the atomically clean InAs showed evidence of arsenic replacement in the near surface region. Subsequent MgO deposition resulted in the appearance of an oxidized indium signal indicating that the bonding interaction between the MgO and the substrate is via indium-oxide bond formation. The conduction and valence band offsets were also estimated for this dielectric-semiconductor structure.
机译:已通过软X射线光发射光谱研究了超薄MgO层与硒钝化InAs表面之间的界面形成。在360℃下用原子氢清洗覆盖有InAs的天然氧化物,产生了无氧化物和无碳的InAs表面。原子上干净的InAs的硒钝化显示了在近表面区域砷替代的证据。随后的MgO沉积导致出现氧化的铟信号,表明MgO与基板之间的键合相互作用是通过铟-氧化物键的形成。还对该电介质-半导体结构估计了导带和价带偏移。

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