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首页> 外文期刊>Applied Surface Science >Fabrication of CdS/CdSe bilayer thin films by chemical bath deposition and electrodeposition, and their photoelectrochemical properties
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Fabrication of CdS/CdSe bilayer thin films by chemical bath deposition and electrodeposition, and their photoelectrochemical properties

机译:化学浴沉积和电沉积法制备CdS / CdSe双层薄膜及其光电化学性能

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摘要

In this work, various kinds of CdS and CdS/CdSe thin films were fabricated on ITO conductive glass by chemical bath deposition (CBD) and/or electrodeposition (ED) methods. These films were characterized by XRD, XRF, SEM and optical absorption. Their photoelectrochemical properties were also investigated. First, two kinds of CdS thin films were firstly deposited on ITO conductive glass by CBD or ED. It was found that the two kinds of CdS films showed different compositions and crystal structures. The CdS film prepared by CBD is S-rich and has a cubic zinc blende structure, while the CdS film prepared by ED is Cd-rich and has a hexagonal wurtzite structure. Furthermore, CdSe was deposited on the as-obtained CdS films by a galvanostatical ED method, resulting in CdS/CdSe bilayer thin films. The achieved CdS/CdSe bilayer thin films showed enhanced optical absorption than the CdS monolayer thin film. For the photoelectrochemical properties, the CdS/CdSe bilayer thin film also exhibited enhanced photocurrent density and photoconversion efficiency in comparison with the CdS monolayer thin film. In particular, the CdS/CdSe bilayer thin film in which the CdS layer was obtained by ED, showed a maximum photocurrent density of about 6 mA/cm~2 and maximum photoconversion efficiency of 3.41%.
机译:在这项工作中,通过化学浴沉积(CBD)和/或电沉积(ED)方法在ITO导电玻璃上制备了各种CdS和CdS / CdSe薄膜。这些膜通过XRD,XRF,SEM和光学吸收来表征。还研究了它们的光电化学性质。首先,首先通过CBD或ED将两种CdS薄膜沉积在ITO导电玻璃上。发现两种CdS膜均具有不同的组成和晶体结构。由CBD制备的CdS膜富含S并且具有立方锌混合结构,而由ED制备的CdS膜富含Cd并且具有六方纤锌矿结构。此外,通过恒电流ED法将CdSe沉积在所获得的CdS膜上,从而得到CdS / CdSe双层薄膜。所获得的CdS / CdSe双层薄膜显示出比CdS单层薄膜增强的光吸收。对于光电化学性质,与CdS单层薄膜相比,CdS / CdSe双层薄膜还表现出增强的光电流密度和光转换效率。特别地,其中通过ED获得CdS层的CdS / CdSe双层薄膜显示出约6mA / cm 2的最大光电流密度和3.41%的最大光转换效率。

著录项

  • 来源
    《Applied Surface Science》 |2014年第15期|278-284|共7页
  • 作者单位

    Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China;

    Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China, Jointment Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Research Center of Laser Fusion, CAEP, Mianyang 621010, China;

    Jointment Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Research Center of Laser Fusion, CAEP, Mianyang 621010, China;

    Jointment Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Research Center of Laser Fusion, CAEP, Mianyang 621010, China;

    Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China, School of Chemical Engineering and Technology, Harbin Institute of Technology, Harbin 150001, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CdS/CdSe; Electrodeposition; Chemical bath deposition; Photocatalytic; Photoelectrochemical properties;

    机译:CdS / CdSe;电沉积;化学浴沉积;光催化;光电性能;

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