机译:脉冲激光沉积制备Ti掺杂ZnO透明导电薄膜的研究
Department of Materials Science, Fudan University, No. 220 HanDan Road, 200433 Shanghai, PR China;
Department of Materials Science, Fudan University, No. 220 HanDan Road, 200433 Shanghai, PR China;
Department of Materials Science, Fudan University, No. 220 HanDan Road, 200433 Shanghai, PR China;
Department of Materials Science, Fudan University, No. 220 HanDan Road, 200433 Shanghai, PR China;
Ti-doped ZnO; Transparent conducting oxide; Pulsed laser deposition;
机译:脉冲激光沉积制备Nb掺杂ZnO透明导电膜
机译:脉冲激光沉积制备超薄掺铝透明导电氧化锌薄膜
机译:制备条件对ZnO:Ge透明导电薄膜的光电性能的影响,由脉冲激光沉积制造
机译:在不同氧气流量下,通过脉冲激光沉积生长的高透明和低电阻率Al掺杂的ZnO薄膜
机译:通过中和离子束溅射和脉冲激光沉积沉积的n型薄膜透明导电氧化物的电学和光学性质的制备和表征。
机译:原子层沉积制备的掺钛ZnO薄膜的结构电学和光学性质
机译:通过脉冲激光沉积生长的透明导电si掺杂ZnO薄膜的结构,电学和光学性质