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Residual stress, mechanical and microstructure properties of multilayer Mo2N/CrN coating produced by R.F Magnetron discharge

机译:射频磁控放电产生的多层Mo2N / CrN涂层的残余应力,力学性能和显微组织性能

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We have investigated the effect of the period thickness of the multilayer Mo2N/CrN deposited on Si substrate produced by reactive magnetron sputtering. Mo2N presents a face centered cubic structure and CrN an orthorhombic one. The residual stress of the coatings was determined by the measurement of the substrate curvature. The microstructure of the multilayer was investigated from the X-ray diffraction and scanning electron microscopy (cross section images). The residual stresses resulting from the deposition of the different bi-layer thickness were measured and correlated to the structural properties of the coating as well as the nanoindentation analysis of the coating. The stresses are compressive and tensile for the individual Mo2N and CrN layer respectively. The result shows that an increase of the multilayer coatings Mo2N/CrN thicknesses induce an increase of the hardness and the elastic modulus, in the other hand the tensile stress increases. The shift of the XRD diffraction peak (1 1 1) of Mo2N at high angle which means the reduction of the residual stress is in good agreement with the residual stresses measurements. (C) 2016 Elsevier B.V. All rights reserved.
机译:我们已经研究了反应磁控溅射在Si衬底上沉积的多层Mo2N / CrN的周期厚度的影响。 Mo2N呈现面心立方结构,而CrN呈现斜方晶结构。涂层的残余应力通过测量基底曲率来确定。通过X射线衍射和扫描电子显微镜(截面图像)研究了多层的微观结构。测量了由不同双层厚度的沉积引起的残余应力,并将其与涂层的结构特性以及涂层的纳米压痕分析相关联。单独的Mo2N和CrN层的应力分别为压缩应力和拉伸应力。结果表明,多层涂层Mo2N / CrN厚度的增加引起硬度和弹性模量的增加,另一方面,拉伸应力增加。 Mo2N的XRD衍射峰(1 1 1)在高角度处的位移,这意味着残余应力的减少与残余应力的测量结果非常吻合。 (C)2016 Elsevier B.V.保留所有权利。

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