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Effect of Bias Voltage on Microstructure and Mechanical Properties of CrN Coatings Prepared by Single Target Magnetron Sputtering

机译:偏压对单靶磁控溅射制备的CRN涂层微结构和力学性能的影响

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CrN coatings were deposited by reactive magnetron sputtering at different substrate bias voltages. The effects of bias voltage on micro-structure and mechanical properties of CrN coatings were studied by scanning electron microscopy, X-ray diffraction, micro-hardness tester and a multi-functional tester for material surface properties, respectively. The results showed that bias voltage had a great influence on morphologies of CrN coatings and CrN coatings presented obvious preferred orientation with the increase of bias voltage. In addition, bias voltages in a certain range can also improve hardness and adhesion of CrN coatings, but higher voltages were not good. In this paper, the adhesion and hardness of CrN coatings presented the trend that a rise first followed by a decline with the ever-increasing bias voltages at the same time, but CrN coating had the superior mechanical properties when the bias voltage was -100 V.
机译:通过在不同的基板偏置电压下通过反应磁控溅射沉积CRN涂层。通过扫描电子显微镜,X射线衍射,微硬度测试仪和用于材料表面性质的多功能测试仪,研究了偏压对CRN涂层微结构和机械性能的影响。结果表明,偏置电压对CRN涂层的形态有很大影响,并且CRN涂层随着偏置电压的增加而呈现明显的优选方向。另外,一定范围内的偏置电压也可以提高CRN涂层的硬度和粘附,但是较高的电压不良好。在本文中,CRN涂层的粘附性和硬度呈现趋势,即同时使用不断增加的偏置电压的升高,但是当偏置电压为-100V时,CRN涂层具有优异的机械性能。

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