...
首页> 外文期刊>Applied Surface Science >Broadband optical properties of graphene and HOPG investigated by spectroscopic Mueller matrix ellipsometry
【24h】

Broadband optical properties of graphene and HOPG investigated by spectroscopic Mueller matrix ellipsometry

机译:穆勒矩阵椭圆光谱法研究石墨烯和HOPG的宽带光学性能

获取原文
获取原文并翻译 | 示例
           

摘要

Optical properties of mono-graphene fabricated by chemical vapor deposition (CVD) and highly oriented pyrolytic graphite (HOPG) are comparatively studied by Mueller matrix ellipsometry (MME) over an ultra-wide energy range of 0.73-6.42 eV. A multilayer stacking model is constructed to describe the CVD mono-graphene, in which the roughness of the glass substrate and the water adsorption on the graphene are considered. We introduce a uniaxial anisotropic dielectric model to parameterize the optical constants of both the graphene and the HOPG. With the established models, broadband optical constants of the graphene and the HOPG are determined from the Mueller matrix spectra based on a point-by-point method and a non-linear regression method, respectively. Two significant absorption peaks at 4.75 eV and 6.31 eV are observed in the extinction coefficient spectra of the mono-graphene, which can be attributed to the von-Hove singularity (i.e., the pi-to-pi* exciton transition) near the M point and the sigma-to-sigma* exciton transition near the Gamma point of the Brillouin zone, respectively. Comparatively, only a major absorption peak at 4.96 eV appears in the ordinary extinction coefficient spectra of the HOPG, which is mainly formed by the pi-to-pi* interband transition. (C) 2018 Elsevier B.V. All rights reserved.
机译:通过化学气相沉积(CVD)和高度取向的热解石墨(HOPG)制备的单石墨烯的光学性质,通过Mueller矩阵椭圆偏光法(MME)在0.73-6.42 eV的超宽能量范围内进行了比较研究。构建多层堆叠模型来描述CVD单石墨烯,其中考虑了玻璃基板的粗糙度和石墨烯上的水吸附。我们引入了单轴各向异性介电模型,以参数化石墨烯和HOPG的光学常数。利用建立的模型,分别基于逐点方法和非线性回归方法,根据穆勒矩阵光谱确定石墨烯和HOPG的宽带光学常数。在单石墨烯的消光系数光谱中观察到在4.75 eV和6.31 eV处有两个明显的吸收峰,这可归因于M点附近的von-Hove奇异性(即pi-pi *激子跃迁)以及布里渊区Gamma点附近的sigma-to-sigma *激子跃迁。相比之下,HOPG的普通消光系数谱中仅出现一个在4.96 eV处的主要吸收峰,这主要是由pi至pi *带间跃迁形成的。 (C)2018 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2018年第may1期|1079-1087|共9页
  • 作者单位

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

    Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Mueller matrix ellipsometry; Graphene; HOPG; Optical constants; Anisotropy;

    机译:穆勒椭圆偏光法;石墨烯;HOPG;光学常数;各向异性;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号