Layout designs of surface barrier coatings for boosting the capability of oxygen/vapor obstruction utilized in flexible electronics

摘要

Graphical abstractDisplay OmittedHighlights•The stress influences of barrier layout design are demonstrated by finite element analysis and analytical solution.•The failure possibility of SiNxfilm under different bending radii is analyzed.•The distance between neutral axis and barrier surface mainly dominates the stress magnitude.•A better barrier design with few pair and a higher stiffness are suggested from the viewpoint of actual feasibility.AbstractOrganic light-emitting diode-based flexible and rollable displays have become a promising candidate for next-generation flexible electronics. For this reason, the design of surface multi-layered barriers should be optimized to enhance the long-term mechanical reliability of a flexible encapsulation that prevents the penetration of oxygen and vapor. In this study, finite element-based stress simulation was proposed to estimate the mechanical reliability of gas/vapor barrier design with low-k/silicon nitride (low-k/SiNx) stacking architecture. Consequently, stress-induced failure of critical thin films within the flexible display under various bending conditions must be considered. The feasibility of one pair SiO2/SiNxbarrier design, which overcomes the complex lamination process, and the critical bending radius, which is decreased to 1.22mm, were also examined. In addition, the influence of distance between neutral axes to the concerned layer surface dominated the induced-stress magnitude rather than the stress compliant mechanism provided from stacked low-k films.