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Selective AuCl3 doping of graphene for reducing contact resistance of graphene devices

机译:石墨烯的选择性AuCl3掺杂可降低石墨烯器件的接触电阻

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摘要

Low contact resistance between metal-graphene contacts remains a well-known challenge for building high-performance two dimensional materials devices. In this study, CVD-grown graphene film was doped via AuCl3 solution selectively only to metal (Ti/Au) contact area to reduce the contact resistances without compromising the channel properties of graphene. With 10 mM-AuCl3 doping, doped graphene exhibited low contact resistivity of similar to 897 Omega m, which is lower than that (similar to 1774 Omega m) of the raw graphene devices. The stability of the contact resistivity in atmospheric environment was evaluated. The contact resistivity increased by 13% after 60 days in an air environment, while the sheet resistance of doped graphene increased by 50% after 30 days. The improved stability of the contact resistivity of AuCl3-doped graphene could be attributed to the fact that the surface of doped-graphene is covered by Ti/Au electrode and the metal prevents the diffusion of AuCl3. (C) 2017 Elsevier B.V. All rights reserved.
机译:金属-石墨烯触点之间的低接触电阻仍然是构建高性能二维材料器件的众所周知的挑战。在这项研究中,通过AuCl3溶液将CVD生长的石墨烯薄膜仅选择性地掺杂到金属(Ti / Au)接触区域,以降低接触电阻,而不会损害石墨烯的通道性能。掺杂10 mM-AuCl3后,掺杂的石墨烯显示出低接触电阻率,类似于897 Omega m,低于原始石墨烯器件的接触电阻率(类似于1774 Omega m)。评价了大气环境下的接触电阻率的稳定性。在空气中60天后,接触电阻增加了13%,而掺杂石墨烯的薄层电阻在30天后增加了50%。掺杂AuCl 3的石墨烯的接触电阻的稳定性提高,可以归因于掺杂石墨烯的表面被Ti / Au电极覆盖,并且金属阻止了AuCl 3的扩散。 (C)2017 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2018年第ptaa期|48-54|共7页
  • 作者单位

    Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea|Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea;

    Sungkyunkwan Univ SKKU, SAINT, Suwon 16419, South Korea;

    Sungkyunkwan Univ SKKU, SAINT, Suwon 16419, South Korea|Sungkyunkwan Univ SKKU, Dept Phys, Suwon 16419, South Korea;

    Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea|Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea;

    Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejon 305600, South Korea;

    Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejon 305600, South Korea;

    Sejong Univ, Graphene Res Inst, Seoul 143747, South Korea|Sejong Univ, Fac Nanotechnol & Adv Mat Engn, Seoul 143747, South Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Graphene; Contact resistivity; AuCl3; Stability;

    机译:石墨烯;接触电阻率;AuCl3;稳定性;
  • 入库时间 2022-08-18 03:04:35

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