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首页> 外文期刊>IEEE Transactions on Applied Superconductivity >High quality SmBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin films on SrTiO/sub 3/ (100) substrates deposited by pulsed electron beam deposition
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High quality SmBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin films on SrTiO/sub 3/ (100) substrates deposited by pulsed electron beam deposition

机译:通过脉冲电子束沉积在SrTiO / sub 3 /(100)基板上沉积高质量SmBa / sub 2 / Cu / sub 3 / O / sub 7- / spl delta //薄膜

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摘要

We for the first time report a successful fabrication of a high-J/sub C/ SmBa/sub 2/Cu/sub 3/O/sub 7-/spl delta//(SmBCO) thin film (/spl sim/240 nm thickness) on SrTiO/sub 3/ (100) substrate by the pulsed electron beam deposition (PED) process. For this study, we systematically investigated the effect of processing parameters, including substrate temperature (Ts), ambient oxygen pressure (PO/sub 2/), and target-to-substrate distance, on superconducting properties, including critical temperature (T/sub C/) and critical current density (J/sub C/), of PED-processed SmBCO films. The highest J/sub C/ value of 1.37 MA/cm/sup 2/ at 77 K in self field was obtained from an optimally processed sample using Ts of 900/spl deg/C (corresponding to real substrate temperature of 810/spl deg/C), PO/sub 2/ of 15 mTorr, and target-to-substrate distance of 9 cm, evidencing that this process is a potential alternative to the PLD process.
机译:我们首次报告成功制造了高J / sub C / SmBa / sub 2 / Cu / sub 3 / O / sub 7- / spl delta //(SmBCO)薄膜(/ spl sim / 240 nm通过脉冲电子束沉积(PED)工艺在SrTiO / sub 3 /(100)衬底上形成厚度)。在这项研究中,我们系统地研究了包括衬底温度(Ts),环境氧气压力(PO / sub 2 /)和目标到衬底距离的处理参数对包括临界温度(T / sub)在内的超导性能的影响。 C /)和PED处理的SmBCO膜的临界电流密度(J / sub C /)。从最佳处理的样品中,使用900 / spl deg / C的Ts(对应于810 / spl deg的实际底材温度),在自电场中在77 K时获得的最高J / sub C /值为1.37 MA / cm / sup 2 /。 / C),PO / sub 2 /为15 mTorr,目标到基板的距离为9 cm,证明该工艺是PLD工艺的潜在替代方案。

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