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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >On-line DLTS investigations of vacancy related defects in low-temperature electron irradiated, boron-doped Si
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On-line DLTS investigations of vacancy related defects in low-temperature electron irradiated, boron-doped Si

机译:DLTS在线研究低温电子辐照硼掺杂Si中与空位有关的缺陷

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摘要

Vacancy-related defects in Si are explored with deep level transient spectroscopy (DLTS). The measurements are performed on-line on irradiated p-type Si and a new trap with the signature (E_(pa), σ_(pa)) = (0.18eV, 6.5 x 10~(-15) cm~2) -only present at cryogenic temperatures - is studied. Furthermore, the bi-stable boron-vacancy complex is studied and it's configuration at low temperatures is investigated and found to have the signature (E_(pa), σ_(pa)) = (0.11 eV, 8.2 x 10~(-15) cm~2).
机译:用深能级瞬态光谱法(DLTS)探索了硅中与空位有关的缺陷。仅在辐照过的p型Si和具有特征(E_(pa),σ_(pa))=(0.18eV,6.5 x 10〜(-15)cm〜2)的新陷阱上在线进行测量研究了在低温下的存在。此外,研究了双稳态硼-空位络合物,并研究了其在低温下的构型,并具有以下特征:(E_(pa),σ_(pa))=(0.11 eV,8.2 x 10〜(-15)厘米〜2)。

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