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Electrochemical fabrication and characterization of nanocontacts and nm-sized gaps

机译:纳米触点和纳米级间隙的电化学制备和表征

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摘要

Copper nanocontacts and molecular-sized nanogaps were prepared and characterized at electrified solid/liquid interfaces employing lithographic and electrochemical techniques. A dedicated four-electrode potentiostat was developed for controlling the electrochemical fabrication process and for monitoring the electrical characteristics of the nanostructures created. The formation and breaking of Cu nanocontacts exhibits conductance quantization characteristics. The statistical analysis of conductance histograms revealed a preferential stability of nanocontacts with integer values of G_0, with a clear preference for 1 G_0, 2 G_0 and 3 G_0. The g1rowth of molecular-sized gaps shows quantized tunneling current, which is attributed to the discrete nature of Cu atoms, water molecules, and specifically adsorbed ions.
机译:制备铜纳米触点和分子大小的纳米间隙,并使用光刻和电化学技术在带电的固/液界面处进行表征。开发了专用的四电极恒电位仪,用于控制电化学制造过程和监视所创建纳米结构的电特性。 Cu纳米接触的形成和破坏表现出电导量化特征。电导直方图的统计分析显示,具有整数G_0的纳米接触具有优先稳定性,其中明显优先选择1 G_0、2 G_0和3 G_0。分子大小的间隙的增长显示出量化的隧穿电流,这归因于Cu原子,水分子以及特定吸附的离子的离散性质。

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