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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis
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Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis

机译:喷雾热解法制备掺氟薄膜氧化物薄膜和纳米棒阵列及表征

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摘要

This paper reports the synthesis and characterization of fluorine-doped tin oxide (FTO) thin films via intermittent spray pyrolysis utilizing a solution mixture of tin chloride pentahydrate and ammonia fluoride. Utilizing the same solution, nanorod arrays were fabricated via template-based growth. Uniform and crack-free FTO films over 20 × 20 mm with a thickness up to 900 nm have been routinely achieved; such FTO films demonstrate electrical resistivity as low as 2.2 × 10~(-4) Ω cm as well as good optical transparency ranging from 75 to 85%. In addition, FTO nanorods were fabricated using template-filling methods at a temperature of 440℃. The nanorods have a diameter of ~ 160-250 nm, appear to be comprised of small nanoparticles 5 - 10 nm in size, and have a resistivity value of 4 × 10~(-1) Ω cm.
机译:本文报道了使用五水合氯化锡和氟化氨溶液的间歇喷雾热解法合成掺氟氧化锡(FTO)薄膜的特性。利用相同的解决方案,通过基于模板的生长来制造纳米棒阵列。通常已经获得了20×20 mm的厚度达900 nm的均匀且无裂纹的FTO膜;此类FTO膜的电阻率低至2.2×10〜(-4)Ωcm,并且具有75%至85%的良好光学透明度。另外,采用模板填充法在440℃的温度下制备了FTO纳米棒。纳米棒的直径约为160-250 nm,似乎由5-10 nm的小纳米颗粒组成,电阻率值为4×10〜(-1)Ωcm。

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