Defect tracking for nanoimprint lithography using optical surface scanner and scanning electron microscope

摘要

Fast optical surface scanners are used in combination with high-resolution scanning electron microscopes to facilitate the identification and tracking of nanoimprint defects. We have confirmed that hard particles cause permanent template damages during imprint, resulting in repeating imprint defects. Since contaminants encountered during imprint are dominated by hard metal oxide particles capable of causing such damage, stringent pre-imprint substrate screening is a critical requirement in a manufacturing environment.