In situ measurement of crystallization of oxide thin films during irradiation with pulsed UV laser in chemical solution deposition process

摘要

The epitaxial and polycrystalline growth of lanthanum strontium manganite films on single crystalline strontium titanate and lanthanum aluminate substrates, respectively, under the irradiation with XeCl lasers in the excimer laser-assisted metal organic deposition (ELA-MOD) process have been previously reported. In order to investigate the growth phenomena, we monitored the thermal radiation from the sample surfaces irradiated with a pulsed ultraviolet laser in situ with near-infrared sensors. The cooling of the lanthanum strontium manganite films on strontium titanate substrates was significantly slower than that of films on lanthanum aluminate substrates. A similar behavior was also observed by the numerical simulation study. This difference in the cooling decay curves may play an important role in the mode by which crystal growth occurs in the ELAMOD process.