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Passivation of trap states in unpurified and purified C60 and the influence on organic field-effect transistor performance

机译:未纯化和纯化的C60中陷阱态的钝化及其对有机场效应晶体管性能的影响

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摘要

We investigate trap-state passivation by addition of ultra-low amounts of n-dopants in organic field-effect transistors (OFET) made of as-received and purified fullerene C60. We find a strong dependence of the OFET threshold voltage (VT) on the density of traps present in the layer. In the case of the unpurified material, VT is reduced from 17.9 V to 4.7 V upon trap passivation by a dopant:C60 ratio of ∼10-3, while the Ion/off current ratio remains high. This suggests that ultra-low doping can be used to effectively compensate impurity and defect-related traps.
机译:我们通过在由接收和纯化的富勒烯C60制成的有机场效应晶体管(OFET)中添加超低含量的n型掺杂剂来研究陷阱态钝化。我们发现,OFET阈值电压(VT)严重依赖于该层中存在的陷阱密度。对于未纯化的材料,当陷阱钝化时,VT的掺杂剂:C60比率约为10 -3 ,VT从17.9 V降低至4.7 V,而离子电流/截止电流比率仍然很高。这表明超低掺杂可用于有效补偿杂质和缺陷相关陷阱。

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