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Electronic structure of graphene oxide and reduced graphene oxide monolayers

机译:氧化石墨烯和还原氧化石墨烯单层的电子结构

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摘要

Graphene oxide (GO) monolayers obtained by Langmuir Blodgett route and suitably treated to obtain reduced graphene oxide (RGO) monolayers were studied by photoelectron spectroscopy. Upon reduction of GO to form RGO C1s x-ray photoelectron spectra showed increase in graphitic carbon content, while ultraviolet photoelectron spectra showed increase in intensity corresponding to C2p-π electrons (∼3.5 eV). X-ray excited Auger transitions C(KVV) and plasmon energy loss of C1s photoelectrons have been analyzed to elucidate the valence band structure. The effective number of (π+σ) electrons as obtained from energy loss spectra was found to increase by ∼28% on reduction of GO.
机译:通过光电子能谱研究了通过Langmuir Blodgett路线获得并经过适当处理以获得还原的氧化石墨烯(RGO)单层的氧化石墨烯(GO)单层。当GO还原形成RGO时,C1s的X射线光电子能谱显示石墨碳含量增加,而紫外光电子能谱显示强度增加,对应于C2p-π电子(〜3.5 eV)。分析了X射线激发的俄歇跃迁C(KVV)和C1s光电子的等离激元能量损失,以阐明价带结构。发现从能量损失谱获得的有效(π+σ)电子数量随着GO的减少而增加了约28%。

著录项

  • 来源
    《Applied Physics Letters》 |2012年第10期|p.103103.1-103103.5|共5页
  • 作者单位

    Department of Physics, Indian Institute of Technology Bombay, Mumbai 400076, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 13:13:39

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