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首页> 外文期刊>Applied Physics Letters >Low power ovonic threshold switching characteristics of thin GeTe6 films using conductive atomic force microscopy
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Low power ovonic threshold switching characteristics of thin GeTe6 films using conductive atomic force microscopy

机译:导电原子力显微镜观察GeTe 6 薄膜的低功率电子阈值开关特性

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Minimizing the dimensions of the electrode could directly impact the energy-efficient threshold switching and programming characteristics of phase change memory devices. A ∼12–15 nm AFM probe-tip was employed as one of the electrodes for a systematic study of threshold switching of as-deposited amorphous GeTe thin films. This configuration enables low power threshold switching with an extremely low steady state current in the on state of 6–8 nA. Analysis of over 48 different probe locations on the sample reveals a stable Ovonic threshold switching behavior at threshold voltage, V of 2.4 ± 0.5 V and the off state was retained below a holding voltage, V of 0.6 ± 0.1 V. All these probe locations exhibit repeatable on-off transitions for more than 175 pulses at each location. Furthermore, by utilizing longer biasing voltages while scanning, a plausible nano-scale control over the phase change behavior from as-deposited amorphous to crystalline phase was studied.
机译:最小化电极的尺寸可能直接影响相变存储器件的节能阈值切换和编程特性。约12-15nm nm的AFM探针被用作电极之一,用于系统研究沉积的非晶GeTe薄膜的阈值转换。这种配置可以在导通状态为6-8nA的情况下以极低的稳态电流实现低功率阈值开关。对样品上48个以上不同探针位置的分析显示,在阈值电压V为2.4±0.50.5V时,Ovonic阈值开关行为稳定,并且关闭状态保持在保持电压V为0.6±0.10.1V以下。每个位置的重复开-关转换超过175个脉冲。此外,通过在扫描时利用更长的偏置电压,研究了从沉积态非晶态到结晶态的相变行为的合理的纳米级控制。

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