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Effect of antimony on the deep-level traps in GaInNAsSb thin films

机译:锑对GaInNAsSb薄膜深层陷阱的影响

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Admittance spectroscopy has been performed to investigate the effect of antimony (Sb) on GaInNAs material in relation to the deep-level defects in this material. Two electron traps, E1 and E2 at an energy level 0.12 and 0.41 eV below the conduction band (EC), respectively, were found in undoped GaInNAs. Bias-voltage dependent admittance confirmed that E1 is an interface-type defect being spatially localized at the GaInNAs/GaAs interface, while E2 is a bulk-type defect located around mid-gap of GaInNAs layer. Introduction of Sb improved the material quality which was evident from the reduction of both the interface and bulk-type defects.
机译:已经进行了导纳光谱研究,研究了锑(Sb)对GaInNAs材料的影响与该材料中的深层缺陷有关。在未掺杂的GaInNAs中发现了两个电子陷阱E1和E2,其能级分别低于导带(E C )0.12和0.41 eV。依赖于偏压的导纳确定E1是在GaInNAs / GaAs界面上空间定位的界面型缺陷,而E2是位于GaInNAs层中间间隙附近的体型缺陷。 Sb的引入改善了材料质量,这从减少界面缺陷和块状缺陷中可以明显看出。

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