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Competition of optical transitions between direct and indirect bandgaps in Ge1−xSnx

机译:Ge 1-x Sn x 中直接带隙和间接带隙之间的光学跃迁竞争

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摘要

Temperature-dependent photoluminescence (PL) study has been conducted in Ge1−xSnx films with Sn compositions of 0.9%, 3.2%, and 6.0% grown on Si. The competing between the direct and indirect bandgap transitions was clearly observed. The relative peak intensity of direct transition with respect to the indirect transition increases with an increase in temperature, indicating the direct transition dominates the PL at high temperature. Furthermore, as Sn composition increases, a progressive enhancement of direct transition was observed due to the reduction of direct-indirect valley separation, which experimentally confirms that the Ge1−xSnx could become the group IV-based direct bandgap material grown on Si by increasing the Sn content.
机译:已经在Ge 1-x Sn x 薄膜中进行了随温度变化的光致发光(PL)研究,该薄膜的Si组成分别在Si上生长了0.9%,3.2%和6.0%。明显观察到直接和间接带隙跃迁之间的竞争。直接过渡相对于间接过渡的相对峰强度随温度的升高而增加,表明在高温下直接过渡占主导地位。此外,随着锡组成的增加,由于直接-间接谷分离的减少,观察到直接过渡的逐步增强,这在实验上证实了Ge 1-x Sn x 通过增加锡含量可以成为在硅上生长的基于IV族的直接带隙材料。

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