机译:在10nm铁电hf_(0.5)Zr_(0.5)O_2薄膜中定量非亚聚对称正交相级分数
SUNY Polytechnic Institute Albany New York 12203 USA;
TEL Technology Center America LLC Albany New York 12203 USA;
TEL Technology Center America LLC Albany New York 12203 USA;
TEL Technology Center America LLC Albany New York 12203 USA;
SUNY Polytechnic Institute Albany New York 12203 USA;
Fraunhofer Institute for Photonic Microsystems Dresden 01109 Germany;
Fraunhofer Institute for Photonic Microsystems Dresden 01109 Germany;
Fraunhofer Institute for Photonic Microsystems Dresden 01109 Germany;
IBM T.J. Watson Research Center P.O. Box 218 Yorktown Heights New York 10598 USA;
TEL Technology Center America LLC Albany New York 12203 USA;
TEL Technology Center America LLC Albany New York 12203 USA;
SUNY Polytechnic Institute Albany New York 12203 USA;
机译:Hf_(0.5)Zr_(0.5)O_2薄膜根据厚度和退火温度的相变和铁电性能
机译:具有大残余极化和低热预算的原子层沉积型锡覆盖锡覆盖层。
机译:金属铁电 - 金属 - 绝缘体 - 半导体栅极堆栈结构的存储器和逻辑应用的铁电场效应晶体管设计点,使用HF_(0.5)Zr_(0.5)O_2膜
机译:铁电HF_(0.5)Zr_(0.5)O_2薄膜中漏电流机制
机译:四(乙基甲基氨基)和四(二甲基氨基)前体在原子层沉积Hf0.5Zr0.5O2薄膜中铁电性能的比较研究
机译:电场诱导的5%Y掺杂HF 0.5 ZR 0.5 o 2:从施电四方相到铁电正晶相的转化