Structural transition and recovery of Ge implanted β-Ga_2O_3

摘要

Ion implantation-induced effects were studied in Ge implanted β-Ga_2O_3 with the fluence and energy of 3 × 10~(13)cm~(-2)/60keV, 5 × 10~(13)cm~(-2)/100keV, and 7 × 10~(13)cm~(-2)/200keV using analytical electron microscopy via scanning/transmission electron microscopy, electron energy loss spectroscopy, and precession electron diffraction via TopSpin. Imaging shows an isolated band of damage after Ge implantation, which extends ～130 nm from the sample surface and corresponds to the projected range of the ions. Electron diffraction demonstrates that the entirety of the damage band is the k phase, indicating an implantation-induced phase transition from β to κ-Ga_2O_3. Post-implantation annealing at 1150°C for 60 s under the O_2 atmosphere led to a back transformation of k to β; however, an ～17nm damage zone remained at the sample surface. Despite the back transformation from κ to β with annealing, O K-edge spectra show changes in the fine structure between the pristine, implanted, and implanted-annealed samples, and topspin strain analysis shows a change in strain between the two samples. These data indicate differences in the electronic/chemical structure, where the change of the oxygen environment extended beyond the implantation zone (～130nm) due to the diffusion of Ge into the bulk material, which, in turn, causes a tensile strain of 0.5%. This work provides a foundation for understanding of the effects of ion implantation on defect/phase evolution in β-Ga_2O_3 and the related recovery mechanism, opening a window toward building a reliable device for targeted applications.