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Investigation of local structures and electronic states of Sb-doped Mg_2Si by fluorescence XAFS and HAXPES

机译:荧光XAFS和HAXPES对SB掺杂MG_2SI的局部结构和电子状态的研究

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摘要

To clarify the origin of the figure of merit in the thermoelectric material Mg_2Si, we performed extended x-ray absorption fine structure (EXAFS) analysis and hard x-ray photoelectron spectroscopy (HAXPES). We elucidate the local structures and electronic states of Mg_2Si, especially focusing on the contribution of doped Sb. EXAFS analysis revealed that Sb substituted Si and that the nearest neighbor distance expanded around Sb. Furthermore, HAXPES confirmed the formation of density of states near the Fermi level by co-doping with 0.5% Zn and 0.5% Sb. The comparison of the experimental and theoretical results suggested that the density of states at the Fermi level was due to the tail of the conduction band, and it was filled by the electrons provided by doped Sb. From a microscopic viewpoint, the results obtained in this study suitably explain why Sb doping increases electrical conductivity and decreases thermal conductivity in Mg_2Si, as reported in a previous study.
机译:为了阐明热电材料MG_2SI中的优点的原点,我们进行了扩展的X射线吸收细结构(EXAF)分析和硬X射线光电子能谱(HAXPE)。我们阐明MG_2SI的局部结构和电子国家,特别是关注掺杂SB的贡献。 EXAFS分析显示,SB取代的Si,并且最接近的邻距围绕SB扩展。此外,HAXPE通过用0.5%Zn和0.5%Sb的共同掺杂确认了在费米水平附近的状态的形成。实验和理论结果的比较表明,FERMI水平处的状态的密度是由于传导带的尾部,并且它被掺杂SB提供的电子填充。从显微镜观点来看,本研究中获得的结果适当地解释了为什么Sb掺杂增加导电性并降低Mg_2SI中的导热性,如先前的研究中所报道的那样。

著录项

  • 来源
    《Applied Physics Letters》 |2020年第14期|143901.1-143901.5|共5页
  • 作者单位

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Next Generation Tatara Co-Creation Centre Shimane University 1060 Nishikawatsu Matsue Shimane 690-8504 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Japan Synchrotron Radiation Research Institute SPring-8 1.1.1 Kouto Sayo Hyogo 679-5198 Japan;

    Japan Synchrotron Radiation Research Institute SPring-8 1.1.1 Kouto Sayo Hyogo 679-5198 Japan;

    Japan Synchrotron Radiation Research Institute SPring-8 1.1.1 Kouto Sayo Hyogo 679-5198 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

    Faculty of Industrial Science and Technology Tokyo University of Science 6-3.1 Niijuku Katsushika Tokyo 125-8585 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 22:18:03

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