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Can surface-transfer doping and UV irradiation during annealing improve shallow implanted nitrogen-vacancy centers in diamond?

机译:在退火过程中可以表面转移掺杂和紫外线照射改善钻石中的浅植入氮空位中心?

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摘要

It has been reported that the conversion yield and coherence time of ion-implanted NV centers improve if the Fermi level is raised or lowered during the annealing step following implantation. Here, we investigate whether surface transfer doping and surface charging, by UV light, can be harnessed to induce this effect. We analyze the coherence times and the yield of NV centers created by ion implantation and annealing, applying various conditions during annealing. Specifically, we study coating diamond with nickel, palladium, or aluminum oxide, to induce positive surface transfer doping, as well as annealing under UV illumination to trigger vacancy charging. The metal-coated diamonds display a two times higher formation yield than the other samples. The coherence time T_2 varies by less than a factor of two between the investigated samples. Both effects are weaker than previous reports, suggesting that stronger modifications of the band structure are necessary to find a pronounced effect. UV irradiation has no effect on the yield and T_2 times.
机译:据报道,如果在植入后退火步骤期间,如果在退火步骤期间升高或降低离子植入的NV中心的转化产率和相干时间。在这里,我们研究了通过UV光的表面传递掺杂和表面充电,可以利用诱导这种效果。我们分析了通过离子植入和退火产生的连贯时间和NV中心的产量,在退火期间施加各种条件。具体而言,我们研究涂料金刚石与镍,钯或氧化铝,诱导阳性表面转移掺杂,以及UV照明下的退火,以触发空位充电。金属涂层的金刚石显示出比其他样品更高的形成产率为两倍。相干时间T_2在研究样品之间的两倍变化小于两倍。这两种效果都比以前的报告较弱,这表明频带结构的更强烈修改是找到发音效果所必需的。紫外线辐射对产量和T_2次没有影响。

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  • 来源
    《Applied Physics Letters》 |2020年第5期|054003.1-054003.5|共5页
  • 作者单位

    Walter Schottky Institute and Department of Physics Technical University of Munich Am Coulombwall 4 85748 Garching Germany;

    Walter Schottky Institute and Department of Physics Technical University of Munich Am Coulombwall 4 85748 Garching Germany;

    Walter Schottky Institute and Department of Physics Technical University of Munich Am Coulombwall 4 85748 Garching Germany;

    Walter Schottky Institute and Department of Physics Technical University of Munich Am Coulombwall 4 85748 Garching Germany;

    Walter Schottky Institute and Department of Physics Technical University of Munich Am Coulombwall 4 85748 Garching Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 22:17:57

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