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Enhanced all-optical switching and domain wall velocity in annealed synthetic-ferrimagnetic multilayers

机译:增强了退火的合成铁磁磁性多层中的全光开关和畴壁速度

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摘要

All-optical switching (AOS) of the magnetization in synthetic ferrimagnetic Pt/Co/Gd stacks has received considerable interest due to its high potential toward integration with spintronic devices, such as magnetic tunnel junctions (MTJs), to enable ultrafast memory applications. Post-annealing is an essential process in the MTJ fabrication to obtain an optimized tunnel magnetoresistance ratio. However, upon integrating AOS with an MTJ in prospect, the annealing effects on single-pulse AOS and domain wall (DW) dynamics in the Pt/Co/Gd stacks have not been systematically investigated yet. In this study, we experimentally explore the annealing effect on AOS and field-induced DW motion in Pt/Co/Gd stacks. The results show that the threshold fluence (F_0) of AOS is reduced significantly as a function of annealing temperature (T_a) ranging from 100 °C to 300 °C. Specifically, a 28% reduction of F_0 can be observed upon annealing at 300°C, which is a critical T_a for MTJ fabrication. Finally, we also demonstrate a significant increase in the DW velocity in the creep regime upon annealing, which is attributed to annealing-induced Co/Gd interface intermixing. Our findings show that the annealed Pt/Co/Gd system facilitates ultra-fast and energy-efficient AOS, as well as enhanced DW velocity, which is highly suitable toward opto-spintronic memory applications.
机译:由于其与磁隧道连接(MTJS)等磁力调速器件(例如,磁隧道连接(MTJS)集成的高电位,磁化的全光切换(AOS)接受了相当大的兴趣。后退火是MTJ制造中的必要过程,以获得优化的隧道磁阻比。然而,在将AOS与MTJ中集成在前景中,对PT / CO / GD堆叠中的单脉冲AOS和畴壁(DW)动态的退火效应尚未得到系统地研究。在本研究中,我们通过实验探讨了PT / CO / GD堆栈中AOS和现场诱导的DW运动的退火效果。结果表明,AO的阈值流量(F_0)显着降低,因为退火温度(T_A)范围为100°C至300℃。具体地,在300℃下退火时可以观察到F_0的28%减少,这是MTJ制造的关键T_A。最后,我们还证明了退火时蠕变制度中的DW速度的显着增加,这归因于退火诱导的CO / GD界面混合。我们的研究结果表明,退火的PT / CO / GD系统有利于超快速和节能AOS,以及增强的DW速度,这非常适合光局内存应用。

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  • 来源
    《Applied Physics Letters》 |2020年第2期|022408.1-022408.5|共5页
  • 作者单位

    Fert Beijing Institute School of Microelectronics Beihang University 100191 Beijing China Department of Applied Physics Eindhoven University of Technology P. O. Box 513 5600 MB Eindhoven The Netherlands;

    Department of Applied Physics Eindhoven University of Technology P. O. Box 513 5600 MB Eindhoven The Netherlands;

    Department of Applied Physics Eindhoven University of Technology P. O. Box 513 5600 MB Eindhoven The Netherlands;

    Fert Beijing Institute School of Microelectronics Beihang University 100191 Beijing China;

    Department of Applied Physics Eindhoven University of Technology P. O. Box 513 5600 MB Eindhoven The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:17:55

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