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Vertical geometry 33.2 A, 4.8 MW cm~2 Ca_2O_3 field-plated Schottky rectifier arrays

机译:垂直几何33.2A,4.8 MW CM〜2 CA_2O_3现场电镀肖特基整流器阵列

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摘要

The performance of arrays consisting of 21 -Ga2O3 field-plated rectifiers fabricated on thick epitaxial layers (n-type carrier concentration approximate to 1.6x10(16) cm(-3)) grown on conducting substrates (carrier concentration 3x10(19) cm(-3)) is reported. We show that by interconnecting the output of 21 smaller (0.4x0.4mm(2) to 1x1mm(2), total area 0.09cm(2)) individual rectifiers using e-beam deposited Au, we can achieve a high total forward output current of 33.2A, at 4.25V in the single-sweep voltage mode, and a low forward turn-on voltage of 2.9V (defined at 100Acm(-2)) and maintain a reverse breakdown voltage of 240V (defined at 1Acm(-2)). The current density was 376Acm(-2), and the on-state resistance was 0.012 cm(2). The total forward current was 10A at 1.9V and 22A at 3V. The power figure-of-merit for the array, V-B(2)/R-ON, was 4.8MWcm(-2), with a reverse recovery time of individual rectifiers of 32ns. The on/off ratio of the rectifier array was in the range of 10(5)-10(10) for +1V/-1 to -100V.
机译:由在导电基板上生长的厚外延层(n型载体浓度近似为1.6×10(16)cm(-3))的21-ga2O3场镀覆整体组成的阵列的性能(n型载流子浓度近似为1.6×10(16)cm(-3))(报道了-3))。我们表明,通过将21个较小的输出互连(0.4x0.4mm(2)至1x1mm(2),总面积为0.09cm(2))各个整流器使用电子束沉积Au,我们可以达到高总前进输出电流33.2a,在单扫电压模式下为4.25V,低前进导通电压为2.9V(在100ACM(-2))上,保持240V的反向击穿电压(定义为1ACM(-2) )))。电流密度为376Acm(-2),导通电阻为0.012cm(2)。总前电流为1.9V和22A的3V。阵列V-B(2)/ R-on的功率符号为4.8mWcm(-2),具有32ns的各个整流器的反向恢复时间。整流器阵列的开/关比在10(5)-10(10)的范围内,+ 1V / -1至-100V。

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  • 来源
    《Applied Physics Letters》 |2019年第23期|232106.1-232106.5|共5页
  • 作者单位

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    Univ Florida Dept Chem Engn Gainesville FL 32611 USA;

    US Naval Res Lab Washington DC 20375 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Drexel Univ Dept Mat Sci & Engn Philadelphia PA 19104 USA;

    Univ Florida Dept Mat Sci & Engn Gainesville FL 32611 USA;

    Tamura Corp Sayama Saitama 3501328 Japan|Novel Crystal Technol Inc Sayama Saitama 3501328 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 22:17:46

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