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High-frequency V-doped ZnO/SiC surface acoustic wave devices with enhanced electromechanical coupling coefficient

机译:具有增强的机电耦合系数的高频V掺杂ZnO / SiC表面声波器件

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摘要

The rapid development of large-volume and high-speed mobile communication systems has increased the demand for high-frequency and wide-band surface acoustic wave (SAW) devices. In this work, ZnO films and V-doped ZnO (V:ZnO) films with (0002) orientation were grown on SiC substrates using a magnetron sputtering method. High-frequency SAW resonators with the resonant frequency ranging from 4 GHz to 6 GHz were fabricated on the above structures. V:ZnO/SiC SAW resonators exhibited a significantly increased electromechanical coupling coefficient (K-2) in the range of 2.80%-5.12%, in a wide normalized thickness range, which is more than a 75% increase compared to that of ZnO-based SAW resonators. Besides, the high quality factor Q ranging from 431 to 593 and an improvement in the figure of merit value were observed for the V:ZnO/SiC SAW resonators operating at 4-6 GHz. Finally, 4.58 GHz SAW filters using V:ZnO films with a larger bandwidth and a lower insertion loss were achieved. This work clearly shows that the ZnO/SiC SAW properties can be improved by V doping, and the V:ZnO/SiC structures have great potential for application in high-frequency and wide-band SAW filters. Published under license by AIP Publishing.
机译:大容量和高速移动通信系统的快速发展增加了对高频和宽带表面声波(SAW)设备的需求。在这项工作中,使用磁控溅射法在SiC衬底上生长ZnO薄膜和(0002)取向的V掺杂ZnO(V:ZnO)薄膜。在上述结构上制造了谐振频率为4 GHz至6 GHz的高频SAW谐振器。在宽的归一化厚度范围内,V:ZnO / SiC SAW谐振器在2.80%-5.12%的范围内表现出显着提高的机电耦合系数(K-2),与ZnO-相比,其增幅超过75%。基于声表面波的谐振器。此外,对于工作在4-6 GHz的V:ZnO / SiC SAW谐振器,可以观察到431至593的高质量因数Q和品质因数值的提高。最终,获得了使用V:ZnO薄膜的4.58 GHz SAW滤波器,具有更大的带宽和更低的插入损耗。这项工作清楚地表明,通过V掺杂可以改善ZnO / SiC SAW的性能,并且V:ZnO / SiC结构在高频和宽带SAW滤波器中具有巨大的应用潜力。由AIP Publishing授权发布。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第11期|113504.1-113504.5|共5页
  • 作者单位

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    SHOULDER Elect Ltd, Wuxi 214124, Jiangsu, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    SHOULDER Elect Ltd, Wuxi 214124, Jiangsu, Peoples R China;

    Nanjing Univ, Sch Elect Sci & Engn, Nanjing 210093, Jiangsu, Peoples R China;

    Shenzhen Univ, Shenzhen Key Lab Sensor Technol, Coll Phys & Energy, Shenzhen 518060, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

    Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 04:18:09

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