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Radiofrequency performance of hydrogenated diamond MOSFETs with alumina

机译:氧化铝氢化金刚石MOSFET的射频性能

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摘要

Hydrogenated diamond MOSFETs with self-oxidized alumina as a gate dielectric are fabricated. The diamond MOSFETs show a high maximum drain current density of 466mA/mm at V-GS = -6V, a transconductance of 58 mS/mm, and an off-state breakdown voltage of -53 V. The maximum output power density reaches 745 mW/mm at 2GHz continuous wave, which is the highest reported value for diamond transistors measured at 2 GHz. The output power value measured is lower than that estimated. Pulse I-V analysis shows that the main factor that affects the output power of the diamond MOSFETs is the traps in the channel. Published under license by AIP Publishing.
机译:制作了具有自氧化氧化铝作为栅极电介质的氢化金刚石MOSFET。金刚石MOSFET在V-GS = -6V时显示出466mA / mm的最大最大漏极电流密度,58 mS / mm的跨导和-53 V的截止击穿电压。最大输出功率密度达到745 mW / mm在2GHz连续波下,这是在2 GHz下测量的金刚石晶体管的最高报告值。测得的输出功率值低于估计值。脉冲I-V分析表明,影响金刚石MOSFET输出功率的主要因素是沟道中的陷阱。由AIP Publishing授权发布。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第6期|063501.1-063501.5|共5页
  • 作者单位

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

    Hebei Semicond Res Inst, Natl Key Lab, ASIC, Shijiazhuang 050051, Hebei, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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