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Ultraviolet light induced electrical hysteresis effect in graphene-GaN heterojunction

机译:紫外光在石墨烯-GaN异质结中的电滞后效应

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摘要

Fabrication of a two- and three-dimensional (2D/3D) heterojunction device has attracted significant attention for developing high performance photodiodes, light emitting diodes, solar cells, and other electronic devices. Here, we reveal the effect of ultraviolet (UV) illumination on electrical hysteresis in a graphene/gallium nitride (GaN) vertical heterojunction Schottky device. A chemical vapor deposited graphene film was transferred onto a free-standing n-type GaN substrate for Schottky diode fabrication, where the interfacial states play a significant role in the occurrence of electrical hysteresis in diode characteristics. A fabricated graphene/GaN Schottky device free from electrical hysteresis under no illumination condition showed the appearance of hysteresis with the illumination of UV light. The residual impurities of graphene and the surface defects of the GaN act as trap sites for the photocarriers; as a result, interface dependent photoresponsivity was observed. Capacitance-voltage analysis also showed the effect of residual impurities on the space charge dependent capacitance and the occurrence of hysteresis due to interface traps of the graphene/GaN heterojunction. Our findings can be significant in understanding the highly sensitive graphene/GaN and other 2D/3D heterojunction interfaces by the UV illumination process for developing high performance devices. Published under license by AIP Publishing.
机译:二维和三维(2D / 3D)异质结器件的制造已引起人们对开发高性能光电二极管,发光二极管,太阳能电池和其他电子器件的关注。在这里,我们揭示了在石墨烯/氮化镓(GaN)垂直异质结肖特基器件中,紫外线(UV)照射对电滞后的影响。将化学气相沉积的石墨烯膜转移到用于肖特基二极管制造的自立式n型GaN衬底上,其中界面状态在二极管特性中的电滞现象的发生中起重要作用。在没有照明条件下没有电滞后的石墨烯/ GaN肖特基器件的制造显示出在紫外光照射下的滞后现象。石墨烯的残留杂质和GaN的表面缺陷充当光载流子的俘获位点;结果,观察到界面依赖性光响应性。电容电压分析还显示了残余杂质对空间电荷依赖性电容的影响,以及由于石墨烯/ GaN异质结的界面陷阱而引起的磁滞现象。我们的发现对于通过开发高性能器件的UV照明工艺来理解高度敏感的石墨烯/ GaN和其他2D / 3D异质结界面具有重要意义。由AIP Publishing授权发布。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第15期|151102.1-151102.5|共5页
  • 作者单位

    Nagoya Inst Technol, Dept Phys Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Dept Phys Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Dept Phys Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Dept Elect & Mech Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan|Nagoya Inst Technol, Frontier Res Inst Mat Sci, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Dept Phys Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Dept Phys Sci & Engn, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan|Nagoya Inst Technol, Frontier Res Inst Mat Sci, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 04:12:52

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