首页> 外文期刊>Applied Physics Letters >Non-volatile resistive switching in oxide ion conductor BiYO_3 thin films
【24h】

Non-volatile resistive switching in oxide ion conductor BiYO_3 thin films

机译:氧化物离子导体BiYO_3薄膜中的非易失性电阻切换

获取原文
获取原文并翻译 | 示例
       

摘要

We experimentally demonstrate non-volatile resistive switching (RS) with a resistance window of similar to 10x in oxide ion conductor BiYO3 (BYO) thin films. (111)-oriented BYO films of multiple thicknesses (20 nm-300 nm) were deposited using the pulsed laser deposition technique on a Pt/TaO2/SiO2/Si substrate. The thermal stability of BYO films in a wide temperature range (10K-800 K) was confirm ed, using temperature dependent dielectric measurements. Further, impedance spectroscopy suggests the presence of oxygen vacancies (defects) at the Au/BYO interface in the high resistance state (after forming) too. Root mean square roughness of the films varied from 1.16 nm to 2.76 nm, confirming a uniform and homogeneous surface. We explain the conduction mechanism in our Au/BYO/Pt devices using space charge limited current (SCLC) and Ohmic conduction models. The bipolar RS characteristics of the BYO devices are empirically modeled on the basis of the oxygen ion driven filamentary switching process. Published by AIP Publishing.
机译:我们实验证明了在氧化物离子导体BiYO3(BYO)薄膜中具有类似于10倍电阻窗口的非易失性电阻开关(RS)。使用脉冲激光沉积技术在Pt / TaO2 / SiO2 / Si衬底上沉积(111)取向的多种厚度(20 nm-300 nm)的BYO膜。使用与温度相关的电介质测量,可以确定BYO膜在宽温度范围(10K-800 K)中的热稳定性。此外,阻抗谱表明在高电阻状态(形成之后)的Au / BYO界面处也存在氧空位(缺陷)。薄膜的均方根粗糙度在1.16 nm至2.76 nm之间变化,确认了均匀且均匀的表面。我们使用空间电荷限制电流(SCLC)和欧姆传导模型来解释Au / BYO / Pt器件中的传导机制。在氧离子驱动的丝状开关过程的基础上,对BYO器件的双极RS特性进行了经验建模。由AIP Publishing发布。

著录项

  • 来源
    《Applied Physics Letters》 |2018年第16期|162101.1-162101.5|共5页
  • 作者单位

    IIT Delhi, Phys Dept, Magnet & Adv Ceram Lab, New Delhi 110016, India;

    IIT Delhi, Dept Elect Engn, New Delhi 110016, India;

    Def Met Res Lab, Adv Magnet Grp, Hyderabad 500066, Telangana, India;

    IIT Delhi, Dept Elect Engn, New Delhi 110016, India;

    Def Met Res Lab, Adv Magnet Grp, Hyderabad 500066, Telangana, India;

    IIT Delhi, Phys Dept, Magnet & Adv Ceram Lab, New Delhi 110016, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 04:09:25

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号