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Determination of the carrier concentration in InGaAsN/GaAs single quantum wells using Raman scattering

机译:使用拉曼散射确定InGaAsN / GaAs单量子阱中载流子浓度

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Raman scattering from longitudinal optical phonon-plasmon coupled mode was observed in a series of InGaAsN/GaAs single quantum well samples grown by metalorganic vapor phase epitaxy. The phonon-plasmon mode spectra were fitted with the dielectric constant function based on Drude model that contains contributions from both lattice vibrations and conduction electrons. The carrier concentration is calculated directly from the plasmon frequency, which is obtained from the fitting procedure. An empirical expression for the electron concentration, [n], in InGaAsN/GaAs samples is determined as [n]≈{2.35×10~(16)(ω_(m)-502)}cm~(-3), where ω_(m) is the peak of the upper frequency branch, L_(+), of the phonon-plasmon mode measured in unit of cm~(-1). The phonon-plasmon coupled mode was also investigated in rapid thermally annealed samples.
机译:在通过金属有机气相外延生长的一系列InGaAsN / GaAs单量子阱样品中,观察到了纵向光学声子-等离子体耦合模式的拉曼散射。声子-等离激元模式光谱符合基于Drude模型的介电常数函数,该函数包含晶格振动和传导电子的贡献。载流子浓度直接从等离激元频率计算,该频率通过拟合过程获得。 InGaAsN / GaAs样品中电子浓度[n]的经验表达式确定为[n]≈{2.35×10〜(16)(ω_(m)-502)} cm〜(-3),其中ω_ (m)是以cm〜(-1)为单位测量的声子-等离子体激元模的高频率分支L _(+)的峰值。还在快速热退火的样品中研究了声子-等离子体耦合模式。

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