Relation between the CF2 radical and plasma density measured using LIF and cutoff probe in a CF4 inductively coupled plasma

摘要

The behavior of the CF2 radical was studied in a CF4 inductively coupled plasma. The CF2 radical was measured using a laser-induced fluorescence method. Absolute electron density was measured using a cutoff probe and the electron temperature was measured using a double probe to study the relationship between these electron properties and the CF2 radical. To examine the relationship between them, the CF2 radical and electron density were measured as a function of the rf power, which is a major external parameter influencing the electron density. As the rf power was increased, the CF2 radical density increased in the range of low electron density, and then decreased beyond a critical electron density. The dependence of the CF2 radical density on the electron density was theoretically analyzed with rate equations. The theoretical result was in good agreement with experiment. (C) 2004 American Institute of Physics.