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Electrical and optical properties of Bi2Ti2O7 thin films prepared by metalorganic decomposition method

机译:金属有机分解法制备Bi2Ti2O7薄膜的电学和光学性质

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Highly (111) oriented Bi2Ti2O7 thin films have been grown on Pt/Ti/SiO2/Si and Al2O3 substrates by metalorganic decomposition method at 550degreesC. The structural properties of the films were examined by x-ray diffraction. The Bi2Ti2O7 films exhibit good insulating property and the leakage current density of the film on Pt/Ti/SiO2/Si is only about 1.56x10(-8) A/cm(2) at 200 kV/cm. The refractive index and extinction coefficient of Bi2Ti2O7 thin films were determined by fitting the infrared spectroscopic ellipsometric data using a classical dielectric function formula. As the wavelength increases, the refractive index decreases, while the extinction coefficient increases. And the band-gap energy E-g was obtained from the optical transmission spectra of Bi2Ti2O7 thin films. (C) 2004 American Institute of Physics.
机译:通过金属有机分解法在550℃下,在Pt / Ti / SiO2 / Si和Al2O3衬底上生长了高度(111)取向的Bi2Ti2O7薄膜。通过X射线衍射检查膜的结构性质。 Bi2Ti2O7膜表现出良好的绝缘性能,并且在200 kV / cm的Pt / Ti / SiO2 / Si上,该膜的泄漏电流密度仅为1.56x10(-8)A / cm(2)左右。 Bi2Ti2O7薄膜的折射率和消光系数是通过使用经典介电函数公式拟合红外光谱椭圆偏振数据确定的。随着波长的增加,折射率降低,而消光系数则增加。从Bi2Ti2O7薄膜的光学透射光谱中获得了带隙能E-g。 (C)2004美国物理研究所。

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