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Structural, magnetic, and transport properties of thin films of the Heusler alloy Co_(2)MnSi

机译:Heusler合金Co_(2)MnSi薄膜的结构,磁性和传输性质

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Thin films of Co_(2)MnSi have been grown on a-plane sapphire substrates from three elemental targets by dc magnetron cosputtering. These films are single phase, have a strong (110) texture, and a saturation magnetization of 4.95μ_(B)/formula unit at 10 K. Films grown at the highest substrate temperature of 715 K showed the lowest resistivity (47 μΩ cm at 4.2 K) and the lowest coercivity (18 Oe). The spin polarization of the transport current was found to be of the order of 54% as determined by point contact Andreev reflection spectroscopy. A decrease in saturation magnetization with a decrease in film thickness and different transport behavior in thinner films indicate graded disorder in these films grown on nonlattice matched substrates.
机译:Co_(2)MnSi薄膜已经通过直流磁控共溅射在三个元素靶材的a面蓝宝石衬底上生长。这些膜是单相的,具有很强的(110)织构,在10 K下的饱和磁化强度为4.95μ_(B)/公式单位。在715 K的最高衬底温度下生长的膜显示出最低的电阻率(47KΩ/ cm)。 4.2 K)和最低矫顽力(18 Oe)。通过点接触安德列夫反射光谱法测定,发现传输电流的自旋极化约为54%。饱和磁化强度的减小以及膜厚度的减小以及较薄膜中不同的传输行为表明,在非晶格匹配基板上生长的这些膜中的梯度紊乱。

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