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Comparison of stability of WSi_(X)/SiC and Ni/SiC Schottky rectifiers to high dose gamma-ray irradiation

机译:WSi_(X)/ SiC和Ni / SiC肖特基整流器对大剂量伽马射线辐射的稳定性比较

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摘要

SiC Schottky rectifiers with moderate breakdown voltages of ~450 V and with either WSi_(X) or Ni rectifying contacts were irradiated with Co-60 γ-rays to doses up to ~315 Mrad. The Ni/SiC rectifiers show severe reaction of the contact after irradiation at the highest dose, badly degrading the forward current characteristics and increasing the on-state resistance by up to a factor of 6 after irradiation. By sharp contrast, the WSi_(X)/SiC devices show little deterioration of the contact with the same conditions and changes in on-state resistance of <20%. The WSi_(X) contacts appear promising for applications requiring improved contact stability.
机译:SiC肖特基整流器具有〜450 V的中等击穿电压,并具有WSi_(X)或Ni整流触点,并以Co-60γ射线辐照,剂量最高为315 Mrad。 Ni / SiC整流器在最高剂量辐照后显示出严重的接触反应,严重恶化了正向电流特性,并在辐照后将通态电阻提高了6倍。与之形成鲜明对比的是,在相同条件下,WSi_(X)/ SiC器件在接触方面几乎没有恶化,导通电阻的变化小于20%。 WSi_(X)触点对于需要改进触点稳定性的应用似乎很有希望。

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