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Tunneling spectroscopy studies of treated aluminum oxide tunnel barrier layers

机译:处理过的氧化铝隧道势垒层的隧道光谱研究

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We report scanning tunneling microscopy and ballistic electron emission microscopy studies of the electronic states of the uncovered and chemisorbed-oxygen covered surface of AlO_x tunnel barrier layers. These states change when chemisorbed oxygen ions are moved into the oxide by either flood gun electron bombardment or by thermal annealing. While untreated samples exhibit band tails extending to zero bias, the former, if sufficiently energetic, results in locally well defined conduction band onsets at ~ 1 V, while the latter results in a progressively higher local conduction band onset, exceeding 2.3 V for 500 and 600℃ thermal anneals.
机译:我们报告扫描隧道显微镜和弹道电子发射显微镜研究的AlO_x隧道势垒层的未发现和化学吸附氧覆盖表面的电子状态。当化学吸附的氧离子通过泛电子枪电子轰击或通过热退火移入氧化物时,这些状态会发生变化。未处理样品的带尾延伸至零偏,而前者(如果具有足够的能量)会导致在〜1 V时局部定义良好的导带开始,而后者会导致逐渐升高的局部导带开始,在500和300 V时超过2.3V。 600℃热退火。

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