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首页> 外文期刊>Applied Physics Letters >Ab initio studies on Schottky barrier heights at metal gate/LaAlO_3 (001) interfaces
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Ab initio studies on Schottky barrier heights at metal gate/LaAlO_3 (001) interfaces

机译:从头开始研究金属栅/ LaAlO_3(001)界面处的肖特基势垒高度

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Schottky barrier heights (SBHs) at metal gate/LaAlO_3 (001) interfaces were studied by using ab initio calculations based on density functional theory. Three kinds of metals, Al, Rh, and Pt, were considered with various interface chemistries on LaAlO_3 (001) surface. It was found that the Fermi level of metal gates is not pinned at metal gate/LaAlO_3 interfaces. The SBH is largely determined by the interface chemistry. The interface metal up to three layers can ultimately decide the SBH, and the SBH at the metal gate/LaAlO_3 interface can be efficiently tuned by including monolayer heterovalent metal at the interface.
机译:通过基于密度泛函理论的从头计算,研究了金属栅/ LaAlO_3(001)界面处的肖特基势垒高度(SBHs)。在LaAlO_3(001)表面上考虑了三种金属Al,Rh和Pt,具有各种界面化学。发现金属栅极的费米能级没有固定在金属栅极/ LaAlO_3的界面上。 SBH在很大程度上取决于界面化学性质。多达三层的界面金属最终可以决定SBH,并且可以通过在界面处包含单层杂金属来有效地调整金属栅极/ LaAlO_3界面处的SBH。

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