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Electric conductivity of boron nitride thin films enhanced by in situ doping of zinc

机译:原位掺杂锌增强氮化硼薄膜的电导率

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摘要

The authors demonstrate that the electric conductivities of cubic and hexagonal boron nitride (c-BN and h-BN) thin films increased markedly by the in situ doping of zinc. The doped films were electrically semiconducting, and conductivities at room temperature increased from 10~(-8) to 10~(-2) Ω~(-1) cm~(-1) with increasing zinc concentration from 400 to 20 000 ppm. Activation energies for electric conduction (E_c) of c-BN decreased from 0.3 to 0.1 eV with increasing zinc concentration, suggesting feasible shallow-level doping. On the other hand, h-BN thin films showed approximately 0.1 eV higher E_c than those of c-BN's, due to the formation of defective B-B bonds.
机译:作者证明,通过原位掺杂锌,立方和六方氮化硼(c-BN和h-BN)薄膜的电导率显着提高。掺杂的薄膜是半导电的,室温下的电导率从10〜(-8)增加到10〜(-2)Ω〜(-1)cm〜(-1),锌浓度从400ppm增加到20000 ppm。随着锌浓度的增加,c-BN的导电活化能(E_c)从0.3 eV降低到0.1 eV,表明可行的浅层掺杂。另一方面,由于形成有缺陷的B-B键,h-BN薄膜的E_c比c-BN薄膜高约0.1 eV。

著录项

  • 来源
    《Applied Physics Letters》 |2006年第11期|p.112124.1-112124.3|共3页
  • 作者

    K. Nose; H. Oba; T. Yoshida;

  • 作者单位

    Department of Materials Engineering, Faculty of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

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