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Determination of domain wall resistance in a cobalt thin film by thickness modulation

机译:厚度调制法测定钴薄膜中的畴壁电阻

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摘要

Inspired by a well-known fact that the magnetic coercivity of a thin film has a strong dependence on its thickness, we have fabricated a 5 X 60 μm and 30 nm thick cobalt (Co) strip with thickness modulation along its long axis. The modulation period of 700 nm with a depth of 8 nm was prepared by a focused ion beam. From magnetic force microscope images, we observed an induced magnetic anisotropy along the short axis of the strip. By comparing out-of-plane magnetoresistance measurements in two magnetic remnant states, we extracted a positive domain wall resistance of 0.03 Ω, corresponding to 0.14% magnetoresistance (MR) in a Co thin film.
机译:受众所周知的事实的启发,薄膜的磁矫顽力强烈依赖于其厚度,我们制造了一条5 X 60μm和30 nm厚的钴(Co)带,沿其长轴方向进行了厚度调节。通过聚焦离子束制备深度为8 nm的700 nm调制周期。从磁力显微镜图像中,我们观察到沿钢带短轴的感应磁各向异性。通过比较两种剩磁状态下的平面外磁阻测量,我们提取了0.03Ω的正畴壁电阻,对应于Co薄膜中的0.14%磁阻(MR)。

著录项

  • 来源
    《Applied Physics Letters》 |2006年第12期|p.122503.1-122503.3|共3页
  • 作者单位

    Department of Physics and Astronomy, Johns Hopkins University, Baltimore, Maryland 21218;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

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