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首页> 外文期刊>Applied Physics Letters >Interfacial microstructure of Fe/AlO_x/Fe magnetic tunnel junctions in high resolution
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Interfacial microstructure of Fe/AlO_x/Fe magnetic tunnel junctions in high resolution

机译:Fe / AlO_x / Fe磁性隧道结的高分辨率界面微结构

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Magnetic tunnel junctions were prepared by deposition of a Ta-buffered Fe-AlO_x-Fe trilayer on a thermally oxidized silicon wafer. In order to investigate the influence of different Fe oxides like a spinel-like phase and a spinel (Hycernite) on the tunneling magnetoresistance effect, a ~(57)Fe tracer was deposited at the lower barrier interface. Using conversion electron Mossbauer spectroscopy the evolution of chemical, structural, and magnetic changes in the tracer was monitored starting from the as-prepared state and after several annealing steps. The nuclear probe technique enables to resolve phase formation at the interface with submonolayer resolution.
机译:通过在热氧化的硅晶片上沉积Ta缓冲的Fe-AlO_x-Fe三层来制备磁性隧道结。为了研究尖晶石样相和尖晶石(水钠钙石)等不同Fe氧化物对隧穿磁阻效应的影响,在下部势垒界面处沉积了〜(57)Fe示踪剂。使用转化电子Mossbauer光谱学,从所准备的状态开始并经过几个退火步骤,监测了示踪剂中化学,结构和磁性的变化。核探针技术能够解决亚单层分辨率的界面相形成问题。

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