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Fabrication and characterization of solid-state nanopores using a field emission scanning electron microscope

机译:使用场发射扫描电子显微镜制备和表征固态纳米孔

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The fabrication of solid-state nanopores using the electron beam of a transmission electron microscope (TEM) has been reported in the past. Here, we report a similar method to fabricate solid-state nanopores using the electron source of a conventional field-emission scanning electron microscope (FESEM) instead. Micromachining was used to create initial pore diameters between 50 nm and 200 nm, and controlled pore shrinking to sub 10 nm diameters was performed subsequently during in situ processing in the FESEM. Noticeably, different shrinking behavior was observed when using irradiation from the electron source of the FESEM than the TEM. Unlike previous reports of TEM mediated pore shrinkage, the mechanism of pore shrinkage when using the FESEM could be a result of surface defects generated by radiolysis and subsequent motion of silicon atoms to the pore periphery.
机译:过去已经报道了使用透射电子显微镜(TEM)的电子束制造固态纳米孔。在这里,我们报告了一种类似的方法,它使用传统的场发射扫描电子显微镜(FESEM)的电子源来制造固态纳米孔。微加工被用来产生在50nm和200nm之间的初始孔径,并且随后在FESEM中的原位处理期间进行受控的孔收缩至小于10nm的直径。明显地,当使用来自FESEM的电子源的辐射而不是TEM时,观察到不同的收缩行为。与先前的TEM介导的孔收缩的报道不同,使用FESEM时孔收缩的机理可能是由于辐射分解产生的表面缺陷以及随后的硅原子向孔周围运动所引起的。

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